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Elmet Technologies

Goodfellow Ultra Clean CVD Graphene Film on SiO2/Si Wafers
Categories: Carbon

Material Notes: State-of-the-art chemical vapor deposition (CVD) methods produce exceptionally high quality continuous monolayer (>95%) graphene film onto a SiO2(300nm)/Si wafer for use as transparent conductors and in other innovative applications. The film may be transferred onto other substrates.

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Physical PropertiesMetricEnglishComments
Particle Size 10 - 20 µm10 - 20 µmDomain Size
 
Electrical PropertiesMetricEnglishComments
Surface Resistivity per Square <= 400 ohm<= 400 ohm
 
Optical PropertiesMetricEnglishComments
Transmission, Visible >= 97 %>= 97 %
 
Descriptive Properties
Domain Size10 - 20 µm
Mobility> 3500 cm²/VsMax 17,000 cm²/Vs

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CGOODF097 / 187011

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